Method for making polymer self-supporting nano-micron-line
Title：
Method for making polymer self-supporting nano-micron-line
Application Number：
 200610075663
Application Date：
 2006/04/18
Announcement Date：
 2006/11/15
Pub. Date：
Publication Number：
 1862379
Announcement Number：
Grant Date：
Granted Pub. Date：
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 G03F 7/00
Applicant(s)：
 Tsinghua Univ.
Inventor(s)：
 Liu Bin, He Yaning, Wang Xiaogong
Key Words：
 polymer, self-supporting, nano-micron-line
Abstract：
 The present invention relates to a method for making polymer self-supporting nano-micrometer wire, belonging to the field of polymer microstructure material technology. Said method includes the following steps: firstly, making mother plate with fluctuant stripe micropattern surface: uniformly mixing silica gel performed polymer of polydimethylsiloxance and silica gel cross-linking agent, pouring the above-mentioned mixture onto the above-mentioned mother plate surface, after the above-mentioned mixture is solidified, removing mother plate to obtain polymer soft stamp dissolving polymer in solvent to obtain ink solution, soaking said soft stamp in said ink solution, then pressing said soft stamp on a baseplate, removing soft stamp to obtain polymer fluctuant stripe micropattern produced after the ink solution is solidified on the baseplate using fluohydric acid solution to etch baseplate so as to obtain polymer self-supporting nano-micrometer wire.
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