Alignment method of array optical probe scanning integrated circuit photoetching system and its equipment |
Title： |
| Alignment method of array optical probe scanning integrated circuit photoetching system and its equipment |
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Application Number： |
03153502 |
Application Date： |
2001/07/26 |
Announcement Date： |
2004/05/12 |
Pub. Date： |
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Publication Number： |
1495538 |
Announcement Number： |
1210627 |
Grant Date： |
2005-7-13 |
Granted Pub. Date： |
2005-7-13 |
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
G03F 9/00, G03F 7/00, H01L 21/027, B81C 1/00 |
Applicant(s)： |
Tsinghua Univ. |
Inventor(s)： |
Xu Duanyi, Qi Guosheng, Qian Kun |
Key Words： |
Alignment method, array, optical probe scanning, integrated circuit, photoetching system |
Abstract： |
The present invention relates to an aligning method in array type optical probe scanning integrated circuit photoetching system and its equipment. It includes the following steps: firstly, defining key point according to circuit diagram, coding difference characteristics of circuit diagram and etch-writing them on the silicon wafer, setting a pair of calibration graphs, making said calibration graph be positioned in circuit diagram place, and the calibration graph is formed from calibration subgraphs. According to the key point etch-writing calibration subgraph on the silicon wafer, when the etching is reached to graph key point, fetching calibration subgraph coordinate and comparing said coordinate with recorded calibration subgraph coordinate. The equipment includes the components of base sent, working table, servomotor, calibration optical head and optical probe array, etc. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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