Array type optical probe scanning IC photoetching method |
Title： |
| Array type optical probe scanning IC photoetching method |
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Application Number： |
01120598 |
Application Date： |
2001/07/26 |
Announcement Date： |
2002/01/30 |
Pub. Date： |
2004/03/10 |
Publication Number： |
1333553 |
Announcement Number： |
1141733 |
Grant Date： |
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Granted Pub. Date： |
2004-3-10 |
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
B81C 5/00, G03F 7/00, H01L 21/027 |
Applicant(s)： |
Qinghua Univ. |
Inventor(s)： |
Xu Duanyi, Qi Gousheng, Fan Xiaodong |
Key Words： |
Array type, optical probe scanning, IC, photoetching method |
Abstract： |
The present invention belongs to the field of microfine engineering manufacture technology, and is characterizedb by that a kind of array optical probe scanning photoetching process is used to make integrated circuit so as to can make mininum wire width of integrated circuit less than 0.1 micrometer, at the same time it features quick speed and high efficiency. It can greatly simplify production process of integrated circuit, and provides a new effective pathway for making super-large-scale integrated circuit. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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