Method for fabricating standard leak holes |
Title: |
Method for fabricating standard leak holes |
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Application Number: |
200410091941 |
Application Date: |
2004/12/30 |
Announcement Date: |
2006/07/05 |
Pub. Date: |
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Publication Number: |
1796958 |
Announcement Number: |
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Grant Date: |
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Granted Pub. Date: |
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ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
G01M 3/02, G01N 35/00 |
Applicant(s): |
Tsinghua Univ. |
Inventor(s): |
Liu Liang, Tang Jie, Liu Peng, Hu Zhaofu, Du Bingchu, Guo Cailin, Chen Jin, Ge Shuaiping, Fan Shoushan |
Key Words: |
fabricating method, standard leak holes |
Abstract: |
The invention relates to a standard leak making method, comprising the steps of: providing a substrate; forming a catalyst film on the substrate, where the catalyst film has a preset pattern structure; growing a preset number of one-dimensional nano structures with a preset size in the position of the catalyst; forming a second film layer on the substrate; removing the one-dimensional nano structures to form through holes in the second film layer, where the through hole has a size corresponding to the one-dimensional nano structure, thus obtaining a standard leak. The invention can obtain a standard leak with good leakage controllability and self- calibrating ability by accurately finding the leakage of the leak through theoretical calculation. |
Claim: |
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Priority: |
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PCT: |
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