Producing method for metal thin-membrane of high-frequency sound surface wave device
Title:
Producing method for metal thin-membrane of high-frequency sound surface wave device
Application Number:
200410097198
Application Date:
2004/12/14
Announcement Date:
2005/05/11
Pub. Date:
Publication Number:
1614884
Announcement Number:
1238967
Grant Date:
2006-1-25
Granted Pub. Date:
2006-1-25
ApplicationType:
Invention
State/Country:
11[China|beijing]
IPC:
H03H 3/08
Applicant(s):
Tsinghua Univ.
Inventor(s):
Pan Feng, Li Dongmei, Zeng Fei
Key Words:
Producing method, metal thin-membrane, high-frequency sound, surface wave, device
Abstract:
The method includes following steps: a transition layer of metal is deposited between piezoelectric crystal and metallic aluminium film. The transition layer of metal uses volatile chloride metals Zr, Nb and Ni. These metals have high melting point, low diffusion coefficient, and can inhibit Al atom migration.
Claim:
Priority:
PCT:
LegalStatus:

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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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