Pretreatment method for load base material used for preparing load type photocatalyst |
Title: |
Pretreatment method for load base material used for preparing load type photocatalyst |
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Application Number: |
200410009264 |
Application Date: |
2004/06/25 |
Announcement Date: |
2005/03/16 |
Pub. Date: |
2006/09/13 |
Publication Number: |
1593765 |
Announcement Number: |
1274420 |
Grant Date: |
2006-9-13 |
Granted Pub. Date: |
2006-9-13 |
ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
B01J 35/00, B01J 37/00 |
Applicant(s): |
Tsinghua University |
Inventor(s): |
Zhang Li, Chen Songzhe, Zhang Pengyi |
Key Words: |
Pretreatment method, load base material, load type photocatalyst |
Abstract: |
The invention relates to a kind of preliminary treatment of the loading base material for manufacturing the loading-form photocatalyst, which belongs to the photocatalysis technique field. The purpose of the invention is to improve the long-term stability of the film photocatalyst in the working environment, and offer a preliminary treatment of the loading base material. Adopting this preliminary treatment, it can ensure that the loading-form photocatalyst keeps long-term high activity in the condition of the water logging or wetting, so that it can improve the economic and the practicability of the relative photocatalysis technique. The preliminary treatment of the loading base material for manufacturing the loading-form photocatalyst of the invention has two steps, adopting the alkaline water solution and the oxalic acid water solution to treat the loading base material in proper order. The base material with the method of the invention can improve the loading capacity of the photocatalysis film, and the bonding strength between the rete of the photocatalysis film and the base material. The method has the simple technological process and the high controllability, so it is completely suitable to the production in enormous quantities. |
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