Doping semiconductor/insulator/semiconductor material having current controlled resistance effect
Title:
Doping semiconductor/insulator/semiconductor material having current controlled resistance effect
Application Number:
200310117195
Application Date:
2003/12/05
Announcement Date:
2004/11/17
Pub. Date:
Publication Number:
1547220
Announcement Number:
Grant Date:
Granted Pub. Date:
ApplicationType:
Invention
State/Country:
11[China|beijing]
IPC:
H01C 7/13
Applicant(s):
Tsinghua University
Inventor(s):
Zhang Xiaozhong, Xue Qingzhong, Zhang Lina
Key Words:
doping semiconductor, insulator, semiconductor material, current, resistance
Abstract:
The invention discloses a kind of semiconductor/insulator/semiconductor material which belongs to electricity sensor material, and which has an effect of 'current controls resistance' produced with PLD method. Based on the Si (100) base plate, the target material is cooling pressed with metal-black lead compound material with different proportion, and then it is deposited with PLD method in a definite temperature. The material has a large Eigen polarization in condition without outer electric field, the polarization is 0.0027 V, and new sensors can be designed with the characters. The product is an electricity sensor material which has a wide prospect.
Claim:
Priority:
PCT:
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