Integrated surface plasma wave generator
Title：
Integrated surface plasma wave generator
Application Number：
 200610011188
Application Date：
 2006/01/13
Announcement Date：
 2006/07/19
Pub. Date：
Publication Number：
 1804587
Announcement Number：
Grant Date：
Granted Pub. Date：
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 G01N 21/41, G01N 23/00
Applicant(s)：
 Tsinghua University
Inventor(s)：
 Huang Yidong, Liu Fang, Zhang Wei, Peng Jiangde
Key Words：
 Integrated, surface plasma wave, generator
Abstract：
 The invention belongs to optoelectronics technique which is characterized in that it integers the semiconductor laser photodiode or the semiconductor luminous photodiode and the mental film in one backing material, it uses the craft adjusting to control the ejecting light field of the semiconductor laser photodiode or the semiconductor luminous photodiode on the end side of the mental or the special surface location so that it can active the plasma field of the mental film surface.
Claim：
Priority：
PCT：
LegalStatus：

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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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