Fast semiconductor heat-treating facility with vertical heat treating chamber
Title:
Fast semiconductor heat-treating facility with vertical heat treating chamber
Application Number:
200310112926
Application Date:
2003/12/26
Announcement Date:
2005/07/06
Pub. Date:
2007/12/19
Publication Number:
1635608
Announcement Number:
100356505
Grant Date:
2007-12-19
Granted Pub. Date:
2007-12-19
ApplicationType:
Invention
State/Country:
11[]
IPC:
H01L 21/00H01L 21/324
Applicant(s):
Tsinghua University
Inventor(s):
Lin Huiwang, Chen Bixian, Wang Shunyuan
Key Words:
semiconductor, heat-treating facility, heat treating chamber, vertical
Abstract:
This invention relates to semiconductor rapid thermal process device with vertical process chamber, which belongs to large-scale integration circuit technique field. It is characterized by the following: it comprises the vertical process chamber, loading chamber, semiconductor transistor lifting structure and also mechanic hand sub-system by case to case, micro machine control sub-system, temperature control sub-system, gas device and heating power. The thermal process chamber comprises vertical cylinder quartz heating chamber, top plate graphite heating device in chamber, and side cylinder graphite heating device.
Claim:
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PCT:
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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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