Method of mfg micron/nanometer combined structural element |
Title： |
| Method of mfg micron/nanometer combined structural element |
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Application Number： |
200510053865 |
Application Date： |
2005/03/14 |
Announcement Date： |
2006/09/20 |
Pub. Date： |
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Publication Number： |
1833999 |
Announcement Number： |
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Grant Date： |
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Granted Pub. Date： |
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ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
B81C 1/00 |
Applicant(s)： |
Tsinghua Univ. |
Inventor(s)： |
Zhou Zhaoying, Zhu Rong, Wang Dingqu, Ye Xiongying |
Key Words： |
micron, nanometer. combined structural, element |
Abstract： |
A process for preparing the device with the micron-nano combined structure includes such steps as doping on substrate to form substrate electrode, generating an insulating layer but exposing substrate electrode, depositing a sacrifice layer but exposing substrate electrode, depositing a polysilicon layer, doping, sputtering a metal layer, generating mass block, electrode and base, etching the sacrifice layer under mass block, fixing one-dimension nano material to electrode and mass block, and etching the connecting beam between base and mass block. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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