Photocatalyst-type anti-biotic material preparing method |
Title: |
Photocatalyst-type anti-biotic material preparing method |
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Application Number: |
200510105656 |
Application Date: |
2005/09/29 |
Announcement Date: |
2006/03/08 |
Pub. Date: |
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Publication Number: |
1742582 |
Announcement Number: |
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Grant Date: |
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Granted Pub. Date: |
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ApplicationType: |
Invention |
State/Country: |
94[China|shenzhen] |
IPC: |
A01N 59/16, A01N 25/34, C03C 25/42, C04B 41/81 |
Applicant(s): |
Tsinghua Univ. Inst., Shenzhen |
Inventor(s): |
Li Rongxian, Zhang Weili |
Key Words: |
Photocatalyst-type, anti-biotic material, preparing method |
Abstract: |
The preparation method of photocatalytic type antimicrobial material includes the following steps: A. preparing antimicrobial solution and pretreating material surface; B. coating material surface with antimicrobial solution and forming antimicrobial film on the material surface; C. drying antimicrobial solution coated on the material surface; D. utilizing thermal treatment to accelerate the combination of antimicrobial layer and base body surface, at the same time making photocatalytic antimicrobial layer implement anatase crystalline conversion. The described antimicrobial solution is antimicrobial sol solution containing nano titanium dioxide or composite antimicrobial sol solution containing titanium dioxide and silver. |
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