Photocatalyst-type anti-biotic material preparing method
Title:
Photocatalyst-type anti-biotic material preparing method
Application Number:
200510105656
Application Date:
2005/09/29
Announcement Date:
2006/03/08
Pub. Date:
Publication Number:
1742582
Announcement Number:
Grant Date:
Granted Pub. Date:
ApplicationType:
Invention
State/Country:
94[China|shenzhen]
IPC:
A01N 59/16, A01N 25/34, C03C 25/42, C04B 41/81
Applicant(s):
Tsinghua Univ. Inst., Shenzhen
Inventor(s):
Li Rongxian, Zhang Weili
Key Words:
Photocatalyst-type, anti-biotic material, preparing method
Abstract:
The preparation method of photocatalytic type antimicrobial material includes the following steps: A. preparing antimicrobial solution and pretreating material surface; B. coating material surface with antimicrobial solution and forming antimicrobial film on the material surface; C. drying antimicrobial solution coated on the material surface; D. utilizing thermal treatment to accelerate the combination of antimicrobial layer and base body surface, at the same time making photocatalytic antimicrobial layer implement anatase crystalline conversion. The described antimicrobial solution is antimicrobial sol solution containing nano titanium dioxide or composite antimicrobial sol solution containing titanium dioxide and silver.
Claim:
Priority:
PCT:
LegalStatus:

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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
2008-3-31
  Selected patents owned by Tsinghua University filed in 2006 and 2007 are load.







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