Openable chip accessing manipulator for high vacuum chemical vapor deposition and epitaxial system |
Title： |
| Openable chip accessing manipulator for high vacuum chemical vapor deposition and epitaxial system |
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Application Number： |
200510086475 |
Application Date： |
2005/09/23 |
Announcement Date： |
2006/03/01 |
Pub. Date： |
2007/11/07 |
Publication Number： |
1739923 |
Announcement Number： |
100346938 |
Grant Date： |
2007-11-7 |
Granted Pub. Date： |
2007-11-7 |
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
B25J 3/00, C23C 16/00 |
Applicant(s)： |
Tsinghua Univ. |
Inventor(s)： |
Qian Peixin, Liang Jubao, Lin Huiwang, Liu Ronghua, Liu Zhihong, Chen Changchun, Zhang Wei |
Key Words： |
high vacuum, chemical vapor deposition, epitaxial system, openable, chip accessing, manipulator |
Abstract： |
The present invention belongs to the field of integrated circuit semiconductor epitaxial growth technology superlattice film material growth technology, and features that the openable chip accessing manipulator based on four-bar linkage mechanism consists of magnetically transmission shaft, thrush spring, thrust baffle, obstacle, double positioning rotation core, two inner sleeves, outer sleeve, changeover shaft and changeover spring. When the magnetically transmission shaft is made moves forwards, the manipulator opens to release chip when the obstacle is blocked for the first time, and closes to hold chip when the obstacle is blocked for the second time, and so on. The present invention has the advantages of accurate and reliable chip accessing, and high repeatability and high stability. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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