Abstract: |
The invention relates to preparing method of filed emitting cathode device. The preparing method of filed emitting cathode device includes following steps: providing an underlay; a layer of grid insulated medium layer, a grid metal layer, an optical etching sub is formed on underlay sequentially; the optical etching sub is imaged to form a preset pattern; grid metal layer and grid insulated medium layer are separately etched to form grid, grid insulated medium separator and grid hole; the optical etching sub is heated and increase the area; the optical etching sub is as mask, metal activator layer is plated on underlay; carbon nanometer tube array is generated on metal activator layer to form field emitting source, the field emitting source is smaller than grid hole. |