Film stretching loading device under scanning microscopy environment and film distortion measurement method
Title：
Film stretching loading device under scanning microscopy environment and film distortion measurement method
Application Number：
 200510086228
Application Date：
 2005/08/15
Announcement Date：
 2006/02/08
Pub. Date：
Publication Number：
 1731135
Announcement Number：
Grant Date：
Granted Pub. Date：
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 G01N 3/28, G01N 3/00, G01N 19/00, G01N 13/16
Applicant(s)：
 Tsinghua University
Inventor(s)：
 Li Xide, Yang Yan
Key Words：
 scanning microscopy environment, film distortion, film stretching, loading device,measurement method
Abstract：
 The invention relates to a film-stretching loading device in scanning microscope environment and a film-deformation measuring method in the field of microscope scanning nondestructive inspection and precision machine. The device uses the designed mechanic structure, pressure ceramic driving system, force buffer system and so on which can do three-space location and angle adjustment to finish film deformation measuring on atom force scanning microscope and electron beam microscope detecting table. It can dose quantity detecting to deformation field of all region or localized region of the micro size film; the thickness of the detected film is from several micrometers to sub-micros; it can finish film original location and on line detecting under the high spacing resolution microscope atom force scanning microscope or electron beam scanning microscope environment combined with the double-exposure digital spot technique, the image related technique or micro-labeling technique.
Claim：
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PCT：
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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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  Selected patents owned by Tsinghua University filed in 2006 and 2007 are load.







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