Process for preparing electrically insualting metal substrate with excellent resistance to heat shock |
Title: |
Process for preparing electrically insualting metal substrate with excellent resistance to heat shock |
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Application Number: |
02123427 |
Application Date: |
2002/06/28 |
Announcement Date: |
2003/02/19 |
Pub. Date: |
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Publication Number: |
1397665 |
Announcement Number: |
1233873 |
Grant Date: |
2005-12-28 |
Granted Pub. Date: |
2005-12-28 |
ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
C23C 28/00, C25D 11/04 |
Applicant(s): |
Tsinghua Univ |
Inventor(s): |
Ma Jusheng, Zhu Jiman, Guo Liquan |
Key Words: |
preparing process, electrically insualting metal substrate, resistance to heat shock |
Abstract: |
An insulative metal substrate with excellent heat shock resistance is prepared from Al sheet through washing in alkali solution, electrolytic polishing, anodizing to prepare insulative layer, baking, depositing copper layer by sputter, evaporation, or chemical plating, and electroplating to increase the thickness of Cu layer to 10-35 microns. Its advantages are high resistance to heat shock, high insulative resistivity greater than 10 to the power 13 ohm.cm, and high breakdown voltage (1000 v). |
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Relevancy information |
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Last Update |
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2008-4-17 |
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Selected patents owned by Tsinghua University filed in 2005 are loaded. |
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2008-3-31 |
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Selected patents owned by Tsinghua University filed in 2006 and 2007 are load. |
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