Fast semiconductor heat-treating facility with vertical heat treating chamber |
Title: |
Fast semiconductor heat-treating facility with vertical heat treating chamber |
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Application Number: |
200310112926 |
Application Date: |
2003/12/26 |
Announcement Date: |
2005/07/06 |
Pub. Date: |
2007/12/19 |
Publication Number: |
1635608 |
Announcement Number: |
100356505 |
Grant Date: |
2007-12-19 |
Granted Pub. Date: |
2007-12-19 |
ApplicationType: |
Invention |
State/Country: |
11[] |
IPC: |
H01L 21/00H01L 21/324 |
Applicant(s): |
Tsinghua University |
Inventor(s): |
Lin Huiwang, Chen Bixian, Wang Shunyuan |
Key Words: |
semiconductor, heat-treating facility, heat treating chamber, vertical |
Abstract: |
This invention relates to semiconductor rapid thermal process device with vertical process chamber, which belongs to large-scale integration circuit technique field. It is characterized by the following: it comprises the vertical process chamber, loading chamber, semiconductor transistor lifting structure and also mechanic hand sub-system by case to case, micro machine control sub-system, temperature control sub-system, gas device and heating power. The thermal process chamber comprises vertical cylinder quartz heating chamber, top plate graphite heating device in chamber, and side cylinder graphite heating device. |
Claim: |
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Relevancy information |
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Other Patents of Same Inventor |
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Last Update |
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2008-4-17 |
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Selected patents owned by Tsinghua University filed in 2005 are loaded. |
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2008-3-31 |
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Selected patents owned by Tsinghua University filed in 2006 and 2007 are load. |
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