Remanent electron beam absorbent radiation device |
Title： |
| Remanent electron beam absorbent radiation device |
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Application Number： |
200510136316 |
Application Date： |
2005/12/31 |
Announcement Date： |
2007/07/04 |
Pub. Date： |
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Publication Number： |
1992097 |
Announcement Number： |
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Grant Date： |
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Granted Pub. Date： |
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ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
G21K 5/00 |
Applicant(s)： |
Tsinghua Tongfang NUCTECH Company Limited |
Inventor(s)： |
Tang Huaping, Liu Yaohong, Zhang Dongsheng, Yan Xinshui, Gao Jianjun, Gao Feng, Liu Jinsheng, Jia Wei, Yin Wei, Zhang Dan, Gu Chong |
Key Words： |
Remanent electron beam, absorbent, radiation device |
Abstract： |
The invention discloses an irradiation plant which can absorb residual electron beam that belongs to fields of radiation processing technology. It includes electron linear accelerator, electron beam drift scanning bracket which is connected with electron linear accelerator, mechanical transport mechanism which is mounted below the electron beam drift scanning bracket and on which the object to be irradiated is placed. It characterized in that an electron beam absorber is mounted just below the electron beam drift scanning bracket and at the bottom of the mechanical transport mechanism. The electron beam absorber and the electron linear accelerator are connected by leads to form an electronic loop to conduct heat. With this invention, the thickness of the inoxidizing coating in electron beam irradiation plant can be decreased, the cost can be saved, and the volume and weight can also be decreased, the local cumulation of charge and quantity of heat can be prevented to realize the self-sield and miniaturization of the electron beam irradiation plant, the applied range of the electron beam irradiation plant can be extended further more. |
Claim： |
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Priority： |
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PCT： |
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