Photo-etching machine silicon chip platform double-platform switching system |
Title： |
| Photo-etching machine silicon chip platform double-platform switching system |
|
Application Number： |
200710119275 |
Application Date： |
2007/07/19 |
Announcement Date： |
2008/01/09 |
Pub. Date： |
|
Publication Number： |
101101454 |
Announcement Number： |
|
Grant Date： |
|
Granted Pub. Date： |
|
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
G03F 7/20H01L 21/027 |
Applicant(s)： |
Tsinghua University |
Inventor(s)： |
Zhu Yu, Zhang Ming, Wang Jinsong, Li Guang, Xu Dengfeng, Yin Wensheng, Duan Guanghong, Jia Songtao |
Key Words： |
Photo-etching machine, silicon chip platform, double-platform, switching system |
Abstract： |
The invention is a photoetcher silicon wafer platform double-platform switching system, comprising a silicon platform operating in exposure working position, and a silicon wafer platform operating in preprocessing working position, where the two silicon wafer platforms are arranged on a base platform, four double-freedom drive units moving along X and Y axes are arranged on the edges of the base platform, the two silicon wafer platforms are located in the space that the four double-freedom drive units form and suspended on the surface of the base platform by air bearings; each drive unit comprises upper and lower straight-line guide rails and guide sleeve, where the upper guide rail is installed in the guide sleeve; two drive units cooperate to drive the silicon platforms to move along X or Y axis. And the invention largely simplifies the system structure and largely reduces the system complexity. |
Claim： |
|
Priority： |
|
PCT： |
|
LegalStatus： |
|
Relevancy information
