Method for improving critical current density of Bi-2223 strip material |
Title: |
Method for improving critical current density of Bi-2223 strip material |
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Application Number: |
200610081162 |
Application Date: |
2006/05/23 |
Announcement Date: |
2006/12/27 |
Pub. Date: |
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Publication Number: |
1885443 |
Announcement Number: |
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Grant Date: |
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Granted Pub. Date: |
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ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
H01B 12/00, H01B 13/00, C25D 7/00, C25D 5/00, C25D 3/12 |
Applicant(s): |
Tsinghua University |
Inventor(s): |
A Mu, Han Zhenghe, Gu Chen |
Key Words: |
improve, critical current density, Bi-2223 strip material |
Abstract: |
The disclosed method to improve critical current for a Bi-2223 belt material comprises: polishing the insulating varnish on selected area of the material with fine sand paper, cleaning, and using a dc constant power as electroplating source to output 3V voltage and alter plating time for different coating thickness. This invention can control ac loss fit to large-scale production. |
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Relevancy information |
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Last Update |
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2008-4-17 |
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Selected patents owned by Tsinghua University filed in 2005 are loaded. |
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2008-3-31 |
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Selected patents owned by Tsinghua University filed in 2006 and 2007 are load. |
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