Polishing slurry for disk base sheet of memory hard disk
Title：
Polishing slurry for disk base sheet of memory hard disk
Application Number：
 02155461
Application Date：
 2002/12/13
Announcement Date：
 2003/05/14
Pub. Date：
Publication Number：
 1417278
Announcement Number：
 1213118
Grant Date：
 2005-8-3
Granted Pub. Date：
 2005-8-3
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 C09G 1/02, B24B 9/02
Applicant(s)：
 Tsinghua Univ.
Inventor(s)：
 Luo Jianbin, Lei Hong, Pan Guoshun
Key Words：
 Polishing slurry, disk base sheet, memory hard disk
Abstract：
 The present invention relates to the technology of manufacturing computer memory and hard disk. The polishing slurry contains abrasive, oxidant and water and is characterized by its water-soluble lubricant and polish balancing agent. The water-soluble lubricant is plyoxyethylenated fatly acid phosphate, plyoxyethylene fatty amide phosphate, fatty acid-polyol ester or their mixture and accounts for 0.2-20 wt%; and the polish balancing agent is water-soluble alcohol and accounts for 0.2-20 wt%. The polishing slurry can reduce the roughness and waviness of memory and hard disk surface to below 0.7 angstrom and eliminate effectively pit, lug, scratch and other faults.
Claim：
Priority：
PCT：
LegalStatus：

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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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  Selected patents owned by Tsinghua University filed in 2006 and 2007 are load.







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