Prepn process of nanometer dot array in controllable size with inverse porous nanometer ball template
Title：
Prepn process of nanometer dot array in controllable size with inverse porous nanometer ball template
Application Number：
 200610089737
Application Date：
 2006/07/14
Announcement Date：
 2007/01/03
Pub. Date：
Publication Number：
 1887688
Announcement Number：
Grant Date：
Granted Pub. Date：
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 B82B 3/00
Applicant(s)：
 Tsinghua Univ.
Inventor(s)：
 Qian Jun, Tuo Xinlin, Yuan Jun, Wang Xiaogang
Key Words：
 nanometer dot array in controllable size, inverse porous nanometer ball template
Abstract：
 The present invention belongs to the field of nanometer photoetching technology, and is especially preparation process of nanometer dot array in controllable density and unit size by means of inverse porous nanometer ball template. The preparation process includes the first self-assembling of monodisperse core-shell nanometer ball to obtain nanometer ball template in single layer regular arrangement; selective dissolving to obtain reverse porous array; modifying the reverse pores in the template by means of reaction ion etching technology to obtain penetrative depositing channels; and depositing one layer of film via film preparing technology and dissolving the porous template in selective solvent to obtain regularly arranged circular nanometer dot array. The said preparation process can prepare dot array of different materials and in high density and controllable size, and may be used in preparing nanometer dot array device and optimizing performance.
Claim：
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