Method for developping monocrystalline iron nanometer thread on silicon substrate |
Title: |
Method for developping monocrystalline iron nanometer thread on silicon substrate |
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Application Number: |
200410088423 |
Application Date: |
2004/11/02 |
Announcement Date: |
2006/05/10 |
Pub. Date: |
2007/04/25 |
Publication Number: |
1769544 |
Announcement Number: |
1312325 |
Grant Date: |
2007-4-25 |
Granted Pub. Date: |
2007-4-25 |
ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
C30B 23/00, C30B 29/62, C23C 14/26 |
Applicant(s): |
Tsinghua University |
Inventor(s): |
Zhang Zhengjun, Pan Chunyu |
Key Words: |
developping method, monocrystalline, iron nanometer thread, silicon substrate |
Abstract: |
This invention relates to a iron namometer production method on the silicon fundus, which belongs to the namometer material preparation technology field. The method is the directly vaporizing method, the material is the wires. When preparing, firsly putting the wires and pure silicon fundus in the vacuum bell cover, making the pressure of the bell cover under 10Pa. then electrifying and heating the wires to vaporize them, after several minutes, stopping electrifying, in this course keeping the vacuum degree with the pump. After reaction, keeping vacuum station until the wires and material cools naturally to avoid the material being oxygenated. The operation in this techonoly is simple, the time is short, and it has an extensive appliance foreground in the making of the high density storage material and activator. |
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Relevancy information |
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Last Update |
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2008-4-17 |
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Selected patents owned by Tsinghua University filed in 2005 are loaded. |
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2008-3-31 |
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Selected patents owned by Tsinghua University filed in 2006 and 2007 are load. |
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