Magnetic field inducing method for growing magnetic one dimension nano line array
Title：
Magnetic field inducing method for growing magnetic one dimension nano line array
Application Number：
 200410058085
Application Date：
 2004/08/13
Announcement Date：
 2005/03/02
Pub. Date：
Publication Number：
 1587025
Announcement Number：
Grant Date：
Granted Pub. Date：
ApplicationType：
 Invention
State/Country：
 11[China|beijing
IPC：
 B82B 3/00
Applicant(s)：
 Tsinghua Univ.
Inventor(s)：
 Tian Feng, Zhu Jing
Key Words：
 Magnetic field inducing, grow, magnetic, one dimension, nano line array
Abstract：
 The present invention relates to magnetic field inducing process of growing one-dimensional nanometer magnetic linear array, and belongs to the field of production technology of one-dimensional nanometer magnetic linear array. The present invention includes two processes of preparing template with homogeneously distributed through holes and DC electric deposition. The DC electric deposition process includes setting homogeneous strong magnetic field outside the electroplating bath; sputtering one metal electrode layer on one side of the template; setting the template as cathode inside the electroplating bath with anode of the metal to be plated, graphite or Pt and electrolyte of the salt solution of the metal to be plated; applying set magnetic field; applying voltage across the cathode and anode and controlling current for constant electric deposition speed for certain time to obtain nanometer linear array grown in template holes.
Claim：
Priority：
PCT：
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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
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