Method for controlling growth of carbon nanotube by ion Injection surface modification |
Title: |
Method for controlling growth of carbon nanotube by ion Injection surface modification |
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Application Number: |
200510098717 |
Application Date: |
2005/09/07 |
Announcement Date: |
2006/04/26 |
Pub. Date: |
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Publication Number: |
1763243 |
Announcement Number: |
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Grant Date: |
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Granted Pub. Date: |
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ApplicationType: |
Invention |
State/Country: |
11[China|beijing] |
IPC: |
C23C 16/26, C23C 16/44, C23C 14/48 |
Applicant(s): |
Tsinghua University |
Inventor(s): |
Zhang Zhengjun, Yue Yang, Liu Chao |
Key Words: |
ion Injection, surface modification, carbon nanotube, growth, controlling method |
Abstract: |
The present invention belongs to the field of nanometer material preparing technology, and is one ion implantation process for surface modification to control carbon nanotube growth. The ion implantation process has inert gas as the particle source. During the preparation or carbon nanotube, clean silicon substrate is first covered with proper mask and set inside ion implantation equipment, and ion implantation is then performed after regulating implanted particle variety, implantation energy and implanted particle number. The treated silicon substrate is set inside tubular vacuum quartz furnace, and carbon nanotube is prepared by means of chemical vapor deposition with ferrocene and xylene as reactants. The said process can obtain selectively grown carbon nanotube on the ion implantation modified silicon substrate, alter surface form of the silicon substrate and control the 2D growth of carbon nanotube. The present invention has wide application foreground in making nanometer electronic devices, field emitting device, etc. |
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Relevancy information |
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Last Update |
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2008-4-17 |
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Selected patents owned by Tsinghua University filed in 2005 are loaded. |
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2008-3-31 |
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Selected patents owned by Tsinghua University filed in 2006 and 2007 are load. |
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