Process for preparing carbon electrode array with high surface area and high gap filling capacity
Title:
Process for preparing carbon electrode array with high surface area and high gap filling capacity
Application Number:
200510070852
Application Date:
2005/05/20
Announcement Date:
2005/11/30
Pub. Date:
2007/06/20
Publication Number:
1702887
Announcement Number:
1322608
Grant Date:
2007-6-20
Granted Pub. Date:
2007-6-20
ApplicationType:
Invention
State/Country:
11[China|beijing]
IPC:
H01M 4/04, B81C 1/00, B81C 5/00, G03F 7/00, G03F 7/004, G03F 7/16, G03F 7/26
Applicant(s):
Tsinghua University
Inventor(s):
Liu Litian, Yue Ruifeng
Key Words:
high surface area, high gap filling capacity, carbon electrode array, preparing process
Abstract:
This invention relates to carbon electrode array process method with large surface area and filling capacity in the field of micro machine system and micro battery, which comprises the following steps: adding some percentage of highly polymers expansion balls into the light etching glue and mixing them evenly; then coating it evenly on silicon slice, silicon nitride, earth silicon, quartz glass or metal underlay bottom surfaces; through drying, exploring, developing procedures; forming one graph thick film etching glue layer with certain deepness to width proportion; then processing light etching glue thermal carbon and forming hollow hole on the carbon electrode array; finally forming carbon electrode array structure with large surface area and filling capacitor.
Claim:
Priority:
PCT:
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