Method for preparing nano dot array of controllable unit size using nano ball template |
Title： |
| Method for preparing nano dot array of controllable unit size using nano ball template |
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Application Number： |
200410083939 |
Application Date： |
2004/10/13 |
Announcement Date： |
2005/03/02 |
Pub. Date： |
2006/08/16 |
Publication Number： |
1588236 |
Announcement Number： |
1270216 |
Grant Date： |
2006-8-16 |
Granted Pub. Date： |
2006-8-16 |
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
G03F 7/20, H01L 21/00 |
Applicant(s)： |
Tsinghua Univ. |
Inventor(s)： |
Wu Peiwen, Tuo Xinlin, Wang Xiaogong |
Key Words： |
preparing method, nano dot array, controllable unit size, nano ball template |
Abstract： |
This invention disclose a method of availing of micro millimeter ball template prepares micro millimeter lattice array of controlled cell size, the method belongs to micro millimeter photo etching technique field. It makes use of plasma ion etching to control size of sedimentation access of micro millimeter ball template, combines with filming step and cleaning step in micro millimeter photo etching technique, thereby acquires micro millimeter lattice array of controlled cell size. The density of micro millimeter lattice array in the lecture experiment is 42G/in2, and it controls cell size in 26-100nm. This method builds directly upon the control of sedimentation access of template, it applies to lattice array of all kinds of stuff. By means of conjoining thin film technique of disparity stuff, micro millimeter ball photo etching technique which is modified by this method could prepare high density micro millimeter lattice array of disparity stuff and controlled cell size. It could use for device based on micro millimeter lattice array, for instance, magnetic store, preparation of transducer and performance optimization of device based on controlled cell size. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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