Process for preparing monocrystalline silicon nano line array with single axial arranging |
Title： |
| Process for preparing monocrystalline silicon nano line array with single axial arranging |
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Application Number： |
200510011753 |
Application Date： |
2005/05/20 |
Announcement Date： |
2005/11/09 |
Pub. Date： |
2007/04/25 |
Publication Number： |
1693191 |
Announcement Number： |
1312034 |
Grant Date： |
2007-4-25 |
Granted Pub. Date： |
2007-4-25 |
ApplicationType： |
Invention |
State/Country： |
11[China|beijing] |
IPC： |
C01B 33/021 |
Applicant(s)： |
Tsinghua Univ. |
Inventor(s)： |
Fang Hui, Peng Kuiqing, Wu Yin, Zhu Jing |
Key Words： |
single axial arranging, monocrystalline, silicon nano line, array, prepare |
Abstract： |
A process for preparing the array of monosilicon nano wires arranged monoaxially includes such steps as washing silicon chip, chemical plating to deposit a nanofilm of Ag or Au on its surface, immersing it in the mixed solution of hydrofluoric acid, iron (or magnesium or nickel) nitrate or H2O2 in a sealed container, baking at ordinary temp-60 deg.C, cooling, rinsing in deionized water, and drying in air. |
Claim： |
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Priority： |
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PCT： |
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LegalStatus： |
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