Micro processing process for silicon nitride ceramic parts
Title：
Micro processing process for silicon nitride ceramic parts
Application Number：
 200510011255
Application Date：
 2005/01/26
Announcement Date：
 2005/08/24
Pub. Date：
 2006/11/01
Publication Number：
 1657496
Announcement Number：
 1282627
Grant Date：
 2006-11-1
Granted Pub. Date：
 2006-11-1
ApplicationType：
 Invention
State/Country：
 11[China|beijing]
IPC：
 C04B 35/584, C04B 35/622
Applicant(s)：
 Tsinghua Univ.
Inventor(s)：
 Li Jingfeng
Key Words：
 silicon nitride ceramic, parts, micro processing, process
Abstract：
 A microprocessing technology for silicon nitride ceramic workpiece with high hardness and resistance to high temp and oxidization includes such steps as shaping by hot die pressing or plasma discharge sintering of Si powder, fine processing by precise machining, or fine electrospark machining, or fine electrospark machining, or photoetching, or reactive ion etching, and heating in N2 for nitrifying reaction. It has high compactness.
Claim：
Priority：
PCT：
LegalStatus：

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2008-4-17
  Selected patents owned by Tsinghua University filed in 2005 are loaded.
2008-3-31
  Selected patents owned by Tsinghua University filed in 2006 and 2007 are load.







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